We supply high performance Titanium Round Sputtering Target (Circular Ti Disc Target). Made of Grade1 / Grade2 pure titanium with purity from 99.95% (3N5),99.99%(4N) up to 99.999%(5N), compliant with ASTM B265 standard. Our titanium round sputtering target features ultra-low impurity, fine uniform grain structure, high density and low oxygen content. It ensures stable sputtering, low particle generation and excellent thin film uniformity & adhesion. Copper backing plate bonding service is available for better heat dissipation. Widely applied in semiconductor barrier layer, 3C electronics, optical anti-reflection coating, solar photovoltaic, medical implant coating, aerospace and decorative PVD magnetron sputtering thin film deposition. We accept custom diameter, thickness and surface finish. As professional titanium material manufacturer, we provide factory wholesale, free samples and full material test certificates.
| Material | Gr1/Gr2/4NTi/Gr36(TiNb)/TiZr/TiAl |
| Production Process | Vacuum Arc Melting + Hot Pressing + Precision Machining/HIP/CIP |
| Size | Disc: φ50-600mm×3-50mm; Plate: 100-1200mm×50-800mm×3-50mm Customized |
| Surface Roughness | Polishing Ra≤0.8μm |
| Grain Size | 50-200μm |
| Density | 7.19g/cm³ |
| Melting Point | 1907ºC |
| Customized Service and Cooperation guarantee | Flexible Customization/Strict Quality Control/ * After-Sales Service: 12-month quality guarantee; if the target has quality problems (such as cracks, low density), we provide free replacement and bear the logistics cost. |
| Application | PVD Sputtering, Decorative Coating, Tool Coating, Automotive Parts |
| Advantage | Ultra-High Purity & Low Impurity/High Density & Long Service Life/Excellent Coating Performance/Flexible Customization & Perfect Bonding |
