Our Titanium Plate Sputtering Target (Planar Ti Sputter Target) is manufactured from high purity Gr1/Gr2 titanium raw material, produced by vacuum melting, rolling, annealing and precision CNC machining. With uniform fine grain structure, low oxygen & low impurity content, high density and stable sputtering performance, our titanium planar plate target ensures consistent thin film quality for PVD magnetron sputtering deposition.
We supply pure titanium plate target and titanium alloy plate target with purity from 3N to 5N. Custom dimensions, mounting holes, chamfer and copper backing plate bonding service are available. All products can be provided with MTC material test certificate. Widely applied in semiconductor wafer, 3C electronics, optical coating, display thin film and industrial hard coating. We support sample, small batch and mass production orders.
| Material | Gr1/Gr2/4NTi/Gr36(TiNb)/TiZr/TiAl |
| Production Process | VAR Rolling Machining |
| Size | Disc: φ50-600mm×3-50mm; Plate: 100-1200mm×50-800mm×3-50mm Customized |
| Surface Roughness | Polishing Ra≤0.8μm |
| Grain Size | 50-200μm |
| Density | 7.19g/cm³ |
| Melting Point | 1907℃ |
| Customized Service and Cooperation guarantee | Flexible Customization/Strict Quality Control/ * After-Sales Service: 12-month quality guarantee; if the target has quality problems (such as cracks, low density), we provide free replacement and bear the logistics cost. |
| Application | PVD Sputtering, Decorative Coating, Tool Coating, Automotive Parts |
| Advantage | Ultra-High Purity & Low Impurity/High Density & Long Service Life/Excellent Coating Performance/Flexible Customization & Perfect Bonding |
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